Grating alignment - Revision history

KevinYager: /* Grating with material */

2015-01-24T15:09:23Z

‎Grating with material

KevinYager at 14:01, 30 September 2014

2014-09-30T14:01:56Z

KevinYager at 15:04, 14 June 2014

2014-06-14T15:04:15Z

KevinYager: /* Grating with material */

2014-06-14T15:03:28Z

‎Grating with material

KevinYager: /* Aligning */

2014-06-13T22:13:13Z

‎Aligning

KevinYager: /* Literature Examples */

2014-06-13T22:08:58Z

‎Literature Examples

KevinYager: /* GISAXS/GIWAXS of materials aligned using gratings */

2014-06-13T22:07:40Z

‎GISAXS/GIWAXS of materials aligned using gratings

KevinYager: /* Aligning */

2014-06-13T21:57:26Z

‎Aligning

KevinYager: /* See Also */

2014-06-13T21:49:05Z

‎See Also

KevinYager: Created page with "In order to align a lithographic (nanoscale) grating with the incident x-ray beam, one must rotate it carefully about the $\phi$ axis (i.e. the film normal directio..."

2014-06-13T21:42:56Z

Created page with "In order to align a lithographic (nanoscale) grating with the incident x-ray beam, one must rotate it carefully about the <math>\phi</math> axis (i.e. the film normal directio..."

New page

In order to align a lithographic (nanoscale) grating with the incident x-ray beam, one must rotate it carefully about the <math>\phi</math> axis (i.e. the film normal direction) until the grating lines are exactly parallel to the incident beam. If the grating is not aligned, the scattering spots seen in [[GISAXS]] will not be symmetric.

==Aligning==
If the

==Origin of Ring==
The "ring" of bright scattering spots that one observes arises from the intersection of the [[Ewald sphere]] with the [[reciprocal-space|reciprocal lattice]]. Because lithographic gratings are so well-ordered, the reciprocal-space peaks are extremely sharp. Thus, the scattering intensity is strongly concentrated into the <math>(q_x,q_z)</math> plane. The curved Ewald sphere intersects this plane to give rise to a circle of intense scattering.

One can perform a 'phi rock': where one integrates the detector signal as the sample is rotated about the <math>\phi</math> axis. This sweeps the Ewald sphere through reciprocal-space, effectively accumulating all the intensity that is along the <math>(q_x,q_z)</math> plane in reciprocal-space. The end result is that the detector image includes the full array of diffraction peaks.

==Grating with material==
Lithographic gratings are often used to align other materials (small molecules, block-copolymers, semiconducting polymers, etc.). When assessing scattering data arising from such systems, one must be careful to correctly interpret the 'aligned' direction.

[[Image:Grating align02.png|center|thumb|500px|]]

Let's say you align the grating at phi=0. There is a peak in reciprocal space at fairly large |q| (let's say the [[P3HT]] 100). Normally we would say that if you see this peak on the detector when phi=0, then we can say the P3HT is aligned with phi=0. However, this isn't quite right because of the curvature of the [[Ewald sphere]]. If the peak is truly aligned with the grating, then the peak on the detector will be maximized when we slightly offset phi, by just enough to counter-act the size of the Bragg angle.

Another way to think about it is to say that if you rotate your grating, and some peak is maximized at phi=gamma degrees, then you shouldn't really say "sample has maximum alignment at gamma", but actually "sample has maximum alignment at (gamma-correction)", where you calculation the correction based on the geometry, Bragg angle, etc.

==See Also==
* [http://scitation.aip.org/content/aip/journal/rsi/83/10/10.1063/1.4758283?ver=pdfcov Direct structural characterisation of line gratings with grazing incidence small-angle x-ray scattering] Jan Wernecke, Frank Scholze, Michael Krumrey ''Rev. Sci. Instrum.'' 2012, 83, 103906 [http://dx.doi.org/10.1063/1.4758283 doi: 10.1063/1.4758283]

* [http://scripts.iucr.org/cgi-bin/paper?S160057671400168X On the assessment by grazing-incidence small-angle X-ray scattering of replica quality in polymer gratings fabricated by nanoimprint lithography] M. Soccio, N. Alayo, I. Martín-Fabiani, D. R. Rueda, M. C. García-Gutiérrez, E. Rebollar, D. E. Martínez-Tong, F. Pérez-Murano and T. A. Ezquerra ''J. Appl. Cryst.'' 2014, 47, 613-618 [http://dx.doi.org/10.1107/S160057671400168X doi: 10.1107/S160057671400168X]

@@ Line 27: / Line 27: @@
 [[Image:Grating align02.png|center|thumb|500px|]]
-Let's say you align the grating at phi=0, and that there is a peak in reciprocal space at fairly large |q| due to some other material (let's say the [[P3HT]] 100). Normally we would say that if you see this peak on the detector when phi=0, then we can say the material (P3HT) is aligned with phi=0. However, this isn't quite right because of the curvature of the [[Ewald sphere]]. If the peak is truly aligned with the grating, then the peak on the detector will be maximized when we slightly offset phi, by just enough to counter-act the size of the Bragg angle.
+Let's say you align the grating at phi=0, and that there is a peak in reciprocal space at fairly large |q| due to some other material (let's say the [[P3HT]] 100). Normally we would say that if you see this peak on the detector when phi=0, then we can say the material (P3HT) is aligned with phi=0. However, this isn't quite right because of the curvature of the [[Ewald sphere]]. If the peak is truly aligned with the grating, then the peak on the detector will be maximized when we slightly offset phi, by just enough to counter-act the size of the [[Bragg's law|Bragg angle]].
 Another way to think about it is to say that if you rotate your grating, and some peak is maximized at phi=gamma degrees, then you shouldn't really say "sample has maximum alignment at gamma", but actually "sample has maximum alignment at (gamma-correction)", where you calculation the correction based on the geometry, Bragg angle, etc.

← Older revision		Revision as of 15:04, 14 June 2014
Line 1:		Line 1:
−	In order to align a lithographic (nanoscale) grating with the incident x-ray beam, one must rotate it carefully about the <math>\phi</math> axis (i.e. the film normal direction) until the grating lines are exactly parallel to the incident beam. If the grating is not aligned, the scattering spots seen in [[GISAXS]] will not be symmetric.	+	In order to align a lithographic (nanoscale) grating with the incident [[x-ray]] beam, one must rotate it carefully about the <math>\phi</math> axis (i.e. the film normal direction) until the grating lines are exactly parallel to the incident beam. If the grating is not aligned, the [[scattering]] spots seen in [[GISAXS]] will not be symmetric.

	==Aligning==		==Aligning==

@@ Line 3: / Line 3: @@
 ==Aligning==
 If the grating is not aligned with the incident beam, the scattering will be asymmetric, with a ring of peaks appearing on one side or the other.
-* If "ring of spots" is on '''right''' you must rotate stage counterclockwise (as viewed from above), i.e. '''negative motion in sphi'''
+* If "ring of spots" is on '''right''' you must rotate stage '''counterclockwise''' (as viewed from above)
-* If "ring of spots" is on '''left''' you must rotate stage clockwise (as viewed from above), i.e. '''positive motion in sphi'''
+* If "ring of spots" is on '''left''' you must rotate stage '''clockwise''' (as viewed from above)
 {|

← Older revision		Revision as of 22:08, 13 June 2014
Line 41:		Line 41:
	* [http://pubs.acs.org/doi/abs/10.1021/nl301759j One-Volt Operation of High-Current Vertical Channel Polymer Semiconductor Field-Effect Transistors] Johnston, D.E.; [[Kevin Yager\|Yager, K.G.]]; Nam, C.-Y.; Ocko, B.M.; Black, C.T. Nano Letters 2012, 8, 4181–4186 [http://dx.doi.org/10.1021/nl301759j doi: 10.1021/nl301759j]		* [http://pubs.acs.org/doi/abs/10.1021/nl301759j One-Volt Operation of High-Current Vertical Channel Polymer Semiconductor Field-Effect Transistors] Johnston, D.E.; [[Kevin Yager\|Yager, K.G.]]; Nam, C.-Y.; Ocko, B.M.; Black, C.T. Nano Letters 2012, 8, 4181–4186 [http://dx.doi.org/10.1021/nl301759j doi: 10.1021/nl301759j]
	* [http://pubs.acs.org/doi/abs/10.1021/nn4060539 Nanostructured Surfaces Frustrate Polymer Semiconductor Molecular Orientation] Johnston, D.E.; [[Kevin Yager\|Yager, K.G.]]; Hlaing, H.; Lu, X.; Ocko, B.M.; Black, C.T. ACS Nano 2014 [http://dx.doi.org/10.1021/nn4060539 doi: 10.1021/nn4060539]		* [http://pubs.acs.org/doi/abs/10.1021/nn4060539 Nanostructured Surfaces Frustrate Polymer Semiconductor Molecular Orientation] Johnston, D.E.; [[Kevin Yager\|Yager, K.G.]]; Hlaing, H.; Lu, X.; Ocko, B.M.; Black, C.T. ACS Nano 2014 [http://dx.doi.org/10.1021/nn4060539 doi: 10.1021/nn4060539]
		+
		+	==See Also==
		+	* [[CD-SAXS]] is frequently used to study gratings in transmission mode.
		+	* [[GTSAXS]] can be used to study gratings in grazing-incidence mode without refraction distortions.

@@ Line 38: / Line 38: @@
 ===GISAXS/GIWAXS of materials aligned using gratings===
-* [http://pubs.acs.org/doi/abs/10.1021/nn202515z Nanoimprint-Induced Molecular Orientation in Semiconducting Polymer Nanostructures] Htay Hlaing, Xinhui Lu, Tommy Hofmann, [[Kevin Yager|Kevin G. Yager, Charles T. Black, and Benjamin M. Ocko ''ACS Nano'' 2011, 5 (9), 7532-7538 [http://dx.doi.org/10.1021/nn202515z doi: 10.1021/nn202515z]
+* [http://pubs.acs.org/doi/abs/10.1021/nn202515z Nanoimprint-Induced Molecular Orientation in Semiconducting Polymer Nanostructures] Htay Hlaing, Xinhui Lu, Tommy Hofmann, [[Kevin Yager|Kevin G. Yager]], Charles T. Black, and Benjamin M. Ocko ''ACS Nano'' 2011, 5 (9), 7532-7538 [http://dx.doi.org/10.1021/nn202515z doi: 10.1021/nn202515z]
 *  [http://pubs.acs.org/doi/abs/10.1021/nl301759j One-Volt Operation of High-Current Vertical Channel Polymer Semiconductor Field-Effect Transistors] Johnston, D.E.; [[Kevin Yager|Yager, K.G.]]; Nam, C.-Y.; Ocko, B.M.; Black, C.T. Nano Letters 2012, 8, 4181–4186 [http://dx.doi.org/10.1021/nl301759j doi: 10.1021/nl301759j]
 * [http://pubs.acs.org/doi/abs/10.1021/nn4060539 Nanostructured Surfaces Frustrate Polymer Semiconductor Molecular Orientation] Johnston, D.E.; [[Kevin Yager|Yager, K.G.]]; Hlaing, H.; Lu, X.; Ocko, B.M.; Black, C.T.  ACS Nano 2014 [http://dx.doi.org/10.1021/nn4060539 doi: 10.1021/nn4060539]

@@ Line 23: / Line 23: @@
 ==Grating with material==
-Lithographic gratings are often used to align other materials (small molecules, block-copolymers, semiconducting polymers, etc.). When assessing scattering data arising from such systems, one must be careful to correctly interpret the 'aligned' direction.
+Lithographic gratings are often used to align other materials (small molecules, [[block-copolymers]], semiconducting polymers, etc.). When assessing scattering data arising from such systems, one must be careful to correctly interpret the 'aligned' direction.
 [[Image:Grating align02.png|center|thumb|500px|]]

@@ Line 20: / Line 20: @@
 Another way to think about it is to say that if you rotate your grating, and some peak is maximized at phi=gamma degrees, then you shouldn't really say "sample has maximum alignment at gamma", but actually "sample has maximum alignment at (gamma-correction)", where you calculation the correction based on the geometry, Bragg angle, etc.
-==See Also==
+==Literature Examples==
 * [http://scitation.aip.org/content/aip/journal/rsi/83/10/10.1063/1.4758283?ver=pdfcov Direct structural characterisation of line gratings with grazing incidence small-angle x-ray scattering] Jan Wernecke, Frank Scholze, Michael Krumrey ''Rev. Sci. Instrum.'' 2012, 83, 103906 [http://dx.doi.org/10.1063/1.4758283 doi: 10.1063/1.4758283]
-* [http://scripts.iucr.org/cgi-bin/paper?S160057671400168X On the assessment by grazing-incidence small-angle X-ray scattering of replica quality in polymer gratings fabricated by nanoimprint lithography] M. Soccio, N. Alayo, I. Martín-Fabiani, D. R. Rueda, M. C. García-Gutiérrez, E. Rebollar, D. E. Martínez-Tong, F. Pérez-Murano and T. A. Ezquerra ''J. Appl. Cryst.'' 2014, 47, 613-618 [http://dx.doi.org/10.1107/S160057671400168X doi: 10.1107/S160057671400168X]
+===GISAXS/GIWAXS of materials aligned using gratings===

Grating alignment - Revision history

KevinYager: /* Grating with material */

KevinYager at 14:01, 30 September 2014

KevinYager at 15:04, 14 June 2014

KevinYager: /* Grating with material */

KevinYager: /* Aligning */

KevinYager: /* Literature Examples */

KevinYager: /* GISAXS/GIWAXS of materials aligned using gratings */

KevinYager: /* Aligning */

KevinYager: /* See Also */

KevinYager: Created page with "In order to align a lithographic (nanoscale) grating with the incident x-ray beam, one must rotate it carefully about the \phi axis (i.e. the film normal directio..."

KevinYager: Created page with "In order to align a lithographic (nanoscale) grating with the incident x-ray beam, one must rotate it carefully about the $\phi$ axis (i.e. the film normal directio..."